For applications where space and weight are limited and a combination of linear and rotary motion is required, a small magnetically coupled sample transfer bar with a CF16 mounting flange provides an ideal solution.

It is smaller and lighter, but its performance is not weak, and it is equipped with NdFeB magnets so that it can easily handle various sample processing applications.

This product can also be customized according to customer requirements.

Magnetically coupled sample rods use a magnetically coupled drive for applications that require a combination of rotational and linear motion. This product is welded with a fully enclosed structure, and the vacuum side end is a specially designed transfer structure for installing sample grabbing devices and other customized devices.

• Magnetically Coupling
• UHV Rated to 10-11 mbar
• Bakeable to 150℃ with External Magnets
• UHV Compatible materials
• Hollow shaft with 20mm OD
• High torque and hardness
• Mounted in any Orientation
• Position lock

Magnetically coupled sample rods use a magnetically coupled drive for applications that require a combination of rotational and linear motion. This product is welded with a fully enclosed structure, and the vacuum side end is a specially designed transfer structure for installing sample grabbing devices and other customized devices.

• Magnetically Coupling
• UHV Rated to 10-11 mbar
• Bakeable to 150℃ with External Magnets
• UHV Compatible materials
• Hollow shaft with 20mm OD
• High torque and hardness
• Mounted in any orientation
• Position lock

Magnetically coupled sample rods use a magnetically coupled drive for applications that require a combination of rotational and linear motion. This product is welded with a fully enclosed structure, and the vacuum side end is a specially designed transfer structure for installing sample grabbing devices and other customized devices.

• Magnetically Coupling
• UHV Rated to 10-11 mbar
• Bakeable to 150℃ with External Magnets
• UHV Compatible materials
• Hollow shaft with 20mm OD
• High torque and hardness
• Mounted in any orientation
• Position lock

The medium-sized three-dimensional translation stage has high maneuverability and can make the welding bellows move in three directions of X, Y, and Z.

• X/Y direction adopts crossed roller and ball screw structure, which is strong and compact.
• The Z direction adopts the combined structure of the optical axis and the ball screw.
• The product is a modular product with multiple configurations to choose from.

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Multi-purpose PVD System with nanoparticle deposition capability at its core.

The NEXUS is an ultra high vacuum PVD system capable of generating both nanoparticles and thin films that is well-suited for both industry and academic research. Serving a wide range of applications including catalysis, photonics, energy storage, sensors, and life sciences. This UHV deposition system can be integrated with analytical tools to provide a fully customized solution for your research needs.

Key Features
• Generate complex materials by combining nanoparticles and thin films
• Hydrocarbon free nanoparticles using NL-UHV
• UHV system with load-lock, bakeout and pumping upgrade option
• Combination turbo/dry backing pumping
• Confocal port geometry for up to 5 sources
• Compatible with third party sources
• Coating of substrates with rotation, heating and biasing options
• Interlocks to protect both personnel and equipment
• Fully automated and recipe driven software

The NL50 is a benchtop vacuum system which deposits ultra-pure non-agglomerated nanoparticles directly on to any surface up to 50mm diameter. The NL50 is specifically designed for shared research or teaching laboratory, where it can be used by students and researchers in parallel on a diverse range of nanotechnology projects without fear of cross contamination. Applications include catalysis, photonics, energy storage, sensors, and life sciences.

Key Features:

• Deposit hydrocarbon free and non-agglomerated nanoparticles
• From sub-monolayer to high porosity 3-D nanocoating
• Surface plasma cleaning and functionalisation
• Generate pure metallic or compound nanoparticles such as oxides and nitrides.
• Wide choice of materials, including Ag, Au, Cu, Ni, Ir, and Pt
• Real time deposition control using a Quartz Crystal Microbalance (QCM)
• Repeatable process with typical cycle time of 30 minutes
• Room temperature deposition is compatible with delicate substrates such as graphene, membranes and plastics

Compact, flexible Physical Vapor Deposition System.

The NL-Cube is a low cost, compact and flexible PVD system that offers nanoparticle deposition capability in addition to standard thin film deposition functionality in one versatile unit. There are two models: the 375 (up to five sources and substrates up to four inches in diameter) and the 300 (up to four sources and substrates up to two inches). Because of their relatively low volumes, the chambers offer rapid pump down and turnaround of around 45 minutes. The Cube is designed with three priorities in mind: cost, functionality, and reliability.

Key Features
• Available sources include magnetrons, nanoparticle, mini-e-beam, thermal boat, atom and ion sources
• Sputter-up or sputter-down configurations
• Rotation, bias, and heating up to 800ºC options
• Turnaround ~ 45 minutes
• Vacuum down to 5E-7 torr
• System chassis containing control systems, power supplies and pumps
• Integrated PC with Spectrum software allows automated process control, complex recipes and datalogging

Modular PVD system for Nanoparticle & Thin film; Non-planar & planar, powder coating and reel-to-reel deposition system.

The NL FLEX is an ultra-versatile PVD System capable of generating both nanoparticles and thin films that is well-suited for both industry and academic research. NL-FLEX is capable of accommodating any kind of substrates including reel-to-reel, non-planar and powder coating. Serving a wide range of applications including catalysis, photonics, energy storage, sensors, and life sciences. This modular PVD deposition system can be integrated with analytical tools to provide a fully customized solution for your research needs.

Key Features
• Generate complex materials by combining nanoparticles and thin films
• Hydrocarbon free nanoparticles using NL-UHV
• Spacious and easy access chamber, ideal for delicate and complex substrates
• Upward or downward facing source configuration
• Compatible with third party sources
• Coating of 3D objects with rotation, heating and biasing options
• Fully automated and recipe driven software

Adjustable flanges can be used to adjust the distance and angular relationship between two flanges. This product uses CF standard flange, and each model can provide an adjustment range of ±5mm in the axial direction and ±3° in the radial direction.

• Mounted in any orientation
• Working Pressure: 10-11 mbar~1 bar
• Bakeable to 200℃
• Welded Bellows Seal with SS 316
• Clear Hole Flanges on Both Sides
• Angular Tilt: ±3°
• Axial Adjustment: ±5 mm

Adjustable flanges can be used to adjust the distance and angular relationship between two flanges. This product uses CF standard flange, and each model can provide an adjustment range of ±5mm in the axial direction and ±3° in the radial direction.

• Mounted in any orientation
• Working Pressure: 10-11 mbar~1 bar
• Bakeable to 200℃
• Welded Bellows Seal with SS 316
• Clear Hole Flanges on Both Sides
• Angular tilt: ±3°
• Axial Adjustment: ±5 mm

Adjustable flanges can be used to adjust the distance and angular relationship between two flanges. This product uses CF standard flange, and each model can provide an adjustment range of ±5mm in the axial direction and ±3° in the radial direction.

• Mounted in any orientation
• Working Pressure: 10-11 mbar~1 bar
• Bakeable to 200℃
• Welded Bellows Seal with SS 316
• Clear Hole Flanges on Both Sides
• Angular tilt: ±3°
• Axial Adjustment: ±5 mm

Adjustable flanges can be used to adjust the distance and angular relationship between two flanges. This product uses CF standard flange, and each model can provide an adjustment range of ±5mm in the axial direction and ±3° in the radial direction.

• Mounted in any orientation
• Working Pressure: 10-11 mbar~1 bar
• Bakeable to 200℃
• Welded Bellows Seal with SS 316
• Clear Hole Flanges on Both Sides
• Angular tilt: ±3°
• Axial Adjustment: ±5 mm

Adjustable flanges can be used to adjust the distance and angular relationship between two flanges. This product uses CF standard flange, and each model can provide an adjustment range of ±5mm in the axial direction and ±3° in the radial direction.

• Mounted in any orientation
• Working Pressure: 10-11 mbar~1 bar
• Bakeable to 200℃
• Welded Bellows Seal with SS 316
• Clear Hole Flanges on Both Sides
• Angular tilt: ±3°
• Axial Adjustment: ±5 mm

This system is used to deposit layers under high vacuum conditions on samples that are RF biased. It is a low temperature technique when compared to typical CVD process, which is a major advantage.

Core System Features:
• Base Pressure 1.10-6 mbar
• Samples up to 300 mm
• Inferior plate of 500 mm diameter with RF bias
• Various Process gases (TMS, Hexane, CF4, O 2, Ar)
• Pumping group (Suitable for corrosive gases)
• Automated Control

Applications:
• Barrier Films
• Insulators
• Optical coatings
• Biomedical

Materials:
• DLC
• Doped/Undoped Amorphous Si
• Dielectrics (Nitrides, Oxynitrides..)

Synthesis of complex materials & crystalline structures is a constantly growing request from research. Pulsed Laser Deposition (PLD) is one answer. It is a versatile coating technique that allows the growth of various materials such as nitrides, oxides, superlattices, polymers and composites etc.

Using years of comprehensive experience and know how in R&D deposition systems and ultra high vacuum technology, Vinci Technologies has designed a Laser deposition system, which is easy to operate and designed for academic & industrial researchers alike.

Advantages:
• Flexible & evolving
• Full supervision
• Cost effective

Main features:
• Thin film growth of complex materials
• UHV
• Oxygen-resistant 950°C 1’’ sample holder
• Adjustable distance from substrate to target
• Combinatorial deposition
• RHEED as option
• 10-8 mbar chamber
• 10-9 mbar with load-lock
• Regulated upstream/downstream pressure control
• Transferable 1-inch substrate holder
• Ports for in-situ characterization
• Reactive or Pulsed Laser Deposition capability
• 8-position target holder
• Turbomolecular pumping
• Optional load lock chamber

Synthesis of complex materials & crystalline structures is an ever growing request from research & development. The Pulsed Laser Deposition (PLD) technique provides an intelligent solution for such requirements. It is a versatile coating technique that allows the growth of various materials such as nitrides, oxides, super lattices, polymers and composites etc.

With over 30 years experience in vacuum and UHV, Vinci Technologies provides tailored solutions to customer requirements with this laser-MBE system. This configuration adapts to a large field of growth parameters. For example, process pressure ranges from 10-10 to hundreds of mbar.

Flexible and evolving, this PLD equipment consists of a chamber with ports for process and characterization.

This system is compatible with 2-inch samples. The UHV & dry pumping design prevent the deposited films from contamination by external sources of pollution.

Samples can be transferred from a load-lock chamber or MECATRANS™ UHV transfer tunnel.

Applications:
• Thin film growth for stoichiometric films of complex compounds

Primary Features:
• Reactive or UHV Pulsed Laser Deposition capability
• RF plasma source
• 5-axis target holder (4 targets or 8 upon request)
• Transferable 2-inch substrate and target holders
• Oxygen-resistant 950°C 2’’ sample holder
• 10-10 mbar chamber
• Turbo molecular, ion & titanium sublimation pumping
• Ports for in-situ characterization
• High pressure RHEED
• Quick maintenance of laser window
• Load lock chamber
• Transfer tunnel compatibility
• Evolutionary system

CF Nut Bolt and Washers with Silver Plated Bolts are used to clamp two flanges together and compress them against the copper gasket creating a vacuum seal for applications involving baking. The silver plating allows for easy disassembly after baking.

Manufactured from: Stainless Steel and Silver Plating. CF Nut Bolt and Washer (Silver Plated Bolts) sets are supplied in sealed plastic bags.

CF Nuts, Bolts and Washers (Silver Plated Bolts) are manufactured to the ISO standard and are compatible with other supplier’s products.

CF Nut Bolt and Washers with Silver Plated Bolts are used to clamp two flanges together and compress them against the copper gasket creating a vacuum seal for applications involving baking. The silver plating allows for easy disassembly after baking.

Manufactured from: Stainless Steel and Silver Plating. CF Nut Bolt and Washer (Silver Plated Bolts) sets are supplied in sealed plastic bags.

CF Nuts, Bolts and Washers (Silver Plated Bolts) are manufactured to the ISO standard and are compatible with other supplier’s products.

CF Nut Bolt and Washers with Silver Plated Bolts are used to clamp two flanges together and compress them against the copper gasket creating a vacuum seal for applications involving baking. The silver plating allows for easy disassembly after baking.

Manufactured from: Stainless Steel and Silver Plating. CF Nut Bolt and Washer (Silver Plated Bolts) sets are supplied in sealed plastic bags.

CF Nuts, Bolts and Washers (Silver Plated Bolts) are manufactured to the ISO standard and are compatible with other supplier’s products.