At UltraHighVacuum.com, we specialise in supplying a comprehensive range of high-quality sputtering targets tailored to meet the diverse needs of our customers.

Sputtering is a Physical Vapor Deposition (PVD) technique used to coat substrates by ejecting atoms from sputtering targets, which then condense onto a substrate in a high-vacuum environment.

Our range enables us to support various deposition requirements and applications and are available in a wide array of materials, including;

• Metals
• Alloys
• Ceramics
• Compound materials
• Precious metals

Unlock the full potential of your coating processes with our exceptional range of sputtering targets, engineered for excellence in Physical Vapor Deposition (PVD). Whether you need metal (including precious metals) , alloy, or ceramic sputtering targets, each type is crafted to deliver unique properties that cater to your specific coating requirements. Our high-quality targets ensure efficient atom ejection and precise deposition in a controlled high-vacuum environment, resulting in superior performance and durability. Don’t settle for anything less, choose our sputtering targets to achieve optimal results in your applications.

Contact us today to learn more about how we can support your coating needs.

Featured:

Precious metal sputtering targets from UltraHighVacuum.com

We specialise in supplying high-quality sputtering targets crafted from a wide range of precious metals and their combinations. These targets are essential for vapor deposition processes in semiconductor and microelectronics manufacturing.

We are dedicated to delivering exceptional quality and prioritising rapid response times to meet your project demands. We welcome your inquiries and look forward to showcasing our team’s expertise and commitment to exceeding your expectations.

About Our Precious Metal Sputtering Sputtering Targets

Our precious metal sputtering targets are utilised in creating thin films or coatings through a technique called sputtering. In this process, a solid metal target is struck by high-energy ions, causing atoms to be ejected from the target and deposited onto a substrate, forming a thin film. This method is widely applied in semiconductors, glass coatings, and solar cell coatings.

Our sputtering targets are made from high-purity gold, platinum, palladium, and silver, as well as alloys of these metals.

Our standard target sizes range from 25 mm in diameter up to 6 inches, with thicknesses from 0.1 mm to 6.35 mm.

If the target you need is not included in our standard product range, we can produce custom items to meet specific requirements. Please let us know your specifications, and we will strive to accommodate your needs.

Dimensions and Materials

We offer sputtering targets in diameters from 4 mm up to 304.8 mm (12 inches) and thicknesses ranging from 0.05 mm to 6 mm.

Refer to the table below for available standard sputtering target sizes and materials. If you don’t see what you’re looking for, please get in touch, our team is here to help.

Discover the difference that high-quality, precision-engineered sputtering targets can make for your application.

Whether you’re working with semiconductors, solar cells, or advanced coatings, our premium precious metal targets are designed to deliver reliable and consistent results.

Contact us today to discuss your project specifications; with a wide range of standard sizes, custom options, and expert support, we’re here to meet your unique requirements.