UHV Pulsed Laser Deposition System

Synthesis of complex materials & crystalline structures is a constantly growing request from  research. Pulsed Laser Deposition (PLD) is one answer. It is a versatile coating technique that allows the growth of various materials such as nitrides, oxides, superlattices, polymers and  composites etc.

Using years of comprehensive experience and know how in R&D deposition systems and ultra high vacuum technology, Vinci Technologies has designed a Laser deposition system, which is easy to operate and designed for academic & industrial researchers alike.

The deposition stage accommodates of substrates up to 1-inches. It has a high temperature oxygen resistant heater in order to enhance crystalline structure for simple elementary coatings and complex ceramic compounds. The deposition stage can be supplied with a motorized rotation for improving uniformity of the films.

The target manipulator accommodates up to EIGHT 1-inch diameter targets and is mounted on a side flange. The selection of the target is determined using the software. Each of the individual targets rotates about its own axis, providing a uniform erosion of the target when using with a laser scanning system.

Option to add analysis systems can be added, like : calorimeter, RHEED, pyrometry, ellipsometry, OES…

Combinatorial deposition capability.

Efficient turbo-pumping group from UHV to high partial pressure of reactive gas.

Upstream/downstream pressure control with feedback loop on capacitive pressure gauge.