Small Scale Production

This system is used to deposit layers under high vacuum conditions on samples that are RF biased . It is a low temperature technique when compared to typical CVD process, which is a major advantage.

Core System Features

• Base Pressure 1. 10 -6 mbar
• Samples up to 300 mm
• Inferior plate of 500 mm diameter with RF bias
• Various Process gases (TMS, Hexane, CF4, O 2, Ar)
• Pumping group (Suitable for corrosive gases)

• Automated Control