PVD-6 Physical Vapor Deposition System
The PVD-6 is a physical vapor deposition system, dedicated to the Sputtering deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of every day applications, as its simplicity to use and its competitive price.
Core System Features:
-Stainless steel – 500 mm diameter cylindrical
-Fast Entry Frontal Door with viewport
-Sample holder for substrates up to 6” in diameter
-Water cooling to avoid excess heating
Easy to Use Software
The R&D orientated system can be supplied with an easy to use automation.
software for full control of any deposition process.
Process supervision software with:
- Vacuum Display
- Process Pressure display
- Pressure display
- Temperature control
- Valve/Shutter management
Fully & Semi Automatic modes
Recipe modes with traceability
User mode Access Levels
Safety management through a PLC:
- Interlock management for power supplies
- Automatic switching of the machine in safe mode
- Pressure, actuators and valves management
- First level securities management
Hardware :
Integrated PC with windows 7 connected to a PLC
Magnetron Sputtering
- 3” magnetron cathodes
- Integrated pneumatic shutters
- RF, DC or DC pulsed source power supplies
- Up to 6 cathodes in sputter up configuration
- Mass flow controller for gas line
- Pressure regulation by throttle valve