Introducing the MBE (2D) system—a sophisticated, state-of-the-art system engineered for the growth and surface analysis of novel materials and devices, including transition metal di-chalcogenide or topological insulator applications. Designed to operate under a pristine, controlled environment, this system empowers researchers to advance material science and device development. The MBE (2D) system is renowned for its exceptional base pressure capabilities, stable process pressure during heating & growth and versatile configuration options, making it an indispensable tool for advanced research in selective epitaxial growth and semiconductor equipment.

Applications
*III-V Ferromagnets
*2D Topological insulators
*TMDs

Core System Features:
*Base Pressure 5 E 10-11 mbar
*LN2 cryo shrouds
*2” molybloc sample puck or 3’’ bare wafer
*Up to 6 Knudsen cells (35 cc)
*Up to 3 cracker cells
*6 x 7 cc (or 4 x 15) linear E-beam
*Pumping groups: TSP Ion Pump, Cryo or Turbomolecular Pumping
*Heating &/or cooling sample stages
*Growth feedback via flux gauge, quartz monitors
*Integrated RHEED or RHEED AUGERS
*Couples with Transfer tunnel, Load locks & Preparation chambers

Multi-purpose PVD system with nanoparticle deposition capability at its core.

The NEXUS is an ultra high vacuum PVD System capable of generating both nanoparticles and thin films that is well-suited for both industry and academic research. Serving a wide range of applications including catalysis, photonics, energy storage, sensors, and life sciences. This UHV deposition system can be integrated with analytical tools to provide a fully customized solution for your research needs.

Key Features
*Generate complex materials by combining nanoparticles and thin films
*Hydrocarbon free nanoparticles using NL-UHV
*UHV system with load-lock, bakeout and pumping upgrade option
*Combination turbo/dry backing pumping
*Confocal port geometry for up to 5 sources
*Compatible with third party sources
*Coating of substrates with rotation, heating and biasing options
*Interlocks to protect both personnel and equipment
*Fully automated and recipe driven software

The NL50 is a benchtop vacuum system which deposits ultra-pure non-agglomerated nanoparticles directly on to any surface up to 50mm diameter. The NL50 is specifically designed for shared research or teaching laboratory, where it can be used by students and researchers in parallel on a diverse range of nanotechnology projects without fear of cross contamination. Applications include catalysis, photonics, energy storage, sensors, and life sciences.

Key Features:

-Deposit hydrocarbon free and non-agglomerated nanoparticles
-From sub-monolayer to high porosity 3-D nanocoating
-Surface plasma cleaning and functionalisation
-Generate pure metallic or compound nanoparticles such as oxides and nitrides.
-Wide choice of materials, including Ag, Au, Cu, Ni, Ir, and Pt
-Real time deposition control using a Quartz Crystal Microbalance(QCM)
-Repeatable process with typical cycle time of 30 minutes
-Room temperature deposition is compatible with delicate substrates such as graphene, membranes and plastics

Compact, flexible Physical Vapor Deposition System.

The NL-Cube is a low cost, compact and flexible PVD system that offers nanoparticle deposition capability in addition to standard thin film deposition functionality in one versatile unit. There are two models: the 375 (up to five sources and substrates up to four inches in diameter) and the 300 (up to four sources and substrates up to two inches). Because of their relatively low volumes, the chambers offer rapid pump down and turnaround of around 45 minutes. The Cube is designed with three priorities in mind: cost, functionality, and reliability.

Key Features
*Available sources include magnetrons, nanoparticle, mini-e-beam, thermal boat, atom and ion sources
*Sputter-up or sputter-down configurations
*Rotation, bias, and heating up to 800ºC options
*Turnaround ~ 45 minutes
*Vacuum down to 5E-7 torr
*System chassis containing control systems, power supplies and pumps
*Integrated PC with Spectrum software allows automated process control, complex recipes and datalogging

Modular PVD system for Nanoparticle & Thin film; Non-planar & planar, powder coating and reel-to-reel deposition system.

The NL FLEX is an ultra-versatile PVD System capable of generating both nanoparticles and thin films that is well-suited for both industry and academic research. NL-FLEX is capable of accommodating any kind of substrates including reel-to-reel , non-planar and powder coating. Serving a wide range of applications including catalysis, photonics, energy storage, sensors, and life sciences. This modular PVD deposition system can be integrated with analytical tools to provide a fully customized solution for your research needs.

Key Features
*Generate complex materials by combining nanoparticles and thin films
*Hydrocarbon free nanoparticles using NL-UHV
*Spacious and Easy Access chamber, ideal for delicate and complex substrates
*Upward or Downward facing source configuration
*Compatible with third party sources
*Coating of 3D objects with rotation, heating and biasing options
*Fully automated and recipe driven software

Synthesis of complex materials & crystalline structures is a constantly growing request from research. Pulsed Laser Deposition (PLD) is one answer. It is a versatile coating technique that allows the growth of various materials such as nitrides, oxides, superlattices, polymers and composites etc.

Using years of comprehensive experience and know how in R&D deposition systems and ultra high vacuum technology, Vinci Technologies has designed a Laser deposition system, which is easy to operate and designed for academic & industrial researchers alike.

Advantages:
-Flexible & evolving
-Full supervision
-Cost effective

Main features:
-Thin film growth of complex materials
-UHV
-Oxygen-resistant 950°C 1’’ sample holder
-Adjustable distance from substrate to target
-Combinatorial deposition
-RHEED as option
-10-8 mbar chamber
-10-9 mbar with load-lock
-Regulated upstream/downstream pressure control
-Transferable 1-inch substrate holder
-Ports for in-situ characterization
-Reactive or Pulsed Laser Deposition capability
-8-position target holder
-Turbomolecular pumping
-Optional load lock chamber

Synthesis of complex materials & crystalline structures is an ever growing request from research & development. The Pulsed Laser Deposition (PLD) technique provides an intelligent solution for such requirements. It is a versatile coating technique that allows the growth of various materials such as nitrides, oxides, super lattices, polymers and composites etc.

With over 30 years experience in vacuum and UHV, Vinci Technologies provides tailored solutions to customer requirements with this laser-MBE system. This configuration adapts to a large field of growth parameters. For example, process pressure ranges from 10-10 to hundreds of mbar.

Flexible and evolving, this PLD equipment consists of a chamber with ports for process and characterization.

This system is compatible with 2-inch samples. The UHV & dry pumping design prevent the deposited films from contamination by external sources of pollution.

Samples can be transferred from a load-lock chamber or MECATRANS™ UHV transfer tunnel.

Applications :
*Thin film growth for
stoichiometric films of complex
compounds

Primary Features:
*Reactive or UHV Pulsed Laser Deposition capability
*RF plasma source
*5-axis target holder (4 targets or 8 upon request)
*Transferable 2-inch substrate and target holders
*Oxygen-resistant 950°C 2’’ sample holder
*10-10 mbar chamber
*Turbo molecular, ion & titanium sublimation pumping
*Ports for in-situ characterization
*High pressure RHEED
*Quick maintenance of laser window
*Load lock chamber
*Transfer tunnel compatibility
*Evolutionary system

PVD-4 is a physical vapor deposition system, dedicated to the Evaporation or Sputtering deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of everyday applications, as its simplicity to use and its competitive price.

Deposition techniques include:
-Thermal & EBeam Evaporation
-Magnetron Sputtering
-Hybrid Configuration
-Organic Configuration

Core System Features:
-Stainless steel – 320 mm diameter cylindrical
-Fast Entry Frontal Door with viewport
-Sample holder for substrates up to 4” in diameter
-Water cooling to avoid excess heating

The PVD-6 is a physical vapor deposition system, dedicated to the Sputtering deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of every day applications, as its simplicity to use and its competitive price.

Core System Features:
-Stainless steel – 500 mm diameter cylindrical
-Fast Entry Frontal Door with viewport
-Sample holder for substrates up to 6” in diameter
-Water cooling to avoid excess heating

The PVD20-EB is a physical vapor deposition system, dedicated to the electron beam deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of every day applications, as its simplicity to use and its competitive price.

Core System Features:
-D-shape steel – 500 mm diameter cylindrical chamber
-Full access frontal Door with 2 viewports for easy
maintenance
-Sample holder for substrates up to 6” in diameter
-Rotating and water cooled substrate holder
-Water cooling to avoid excess heating
-Secured cryo pumping group

E-Beam Evaporation:
-8X8 cc or 6X7 cc electron beam source (Ti, Au, Ag, Al, Cr, W, Pt)
-Power supply from 3 kW to 12 kW
-Gas panel for Ar, O2, N2
-Accurate control of deposition rates
-Loadlock (option)
-RF plasma pre-cleaning (option)

The PVD20-S is a physical vapor deposition system, dedicated to the sputtering deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of every day applications, as is, its simplicity to use and its competitive price.

Core System Features:
-D-shape steel – 500 mm diameter cylindrical
-Full access frontal Door with 2 viewports for easy
maintenance
-Sample holder for substrates up to 6” in diameter
-Rotating and heating (up to 350°C) substrate holder
-Water cooling to avoid excess heating
-Secured cryo pumping group (option)
-Loadlock (option)
-RF plasma pre-cleaning (option)

Sputtering Process:
-Up to 4 x 3-inch cathode magnetrons in Sputter Up configuration
-RF / DC power supply
-Process pressure : 10-3 – 10-1 mbar with a motorized throttle valve
-Up to 8 cathodes in sputter up configuration
-Gas panel for Ar, O2, N2
-Accurate control of deposition rates (crystal sensor)

The PVD20-TE is a physical vapor deposition system, dedicated to the joule heating deposition process of materials. Its evolutionary design is particularly adapted to laboratory requirements in terms of every day applications, as is, its simplicity to use and its competitive price.

Core System Features:
-D-shape steel – 500 mm diameter cylindrical
-Full access frontal Door with 2 viewports for easy
maintenance
-Sample holder for substrates up to 6” in diameter
-Rotating and heating (up to 350°C) substrate holder
-Water cooling to avoid excess heating
-Secured cryo pumping group (option)
-Loadlock (option)
-RF plasma pre-cleaning (option)

Thermal Evaporation Process:
-Evaporation by joule effect
-Up to 4 sources (boats, rods, baskets, filament, crucibles)
-Cross contamination shields included
-DC power supply with temperature regulation
-End Hall Effect pre clean/deposition assist
-Gas panel for Ar, O2, N2
-Accurate control of deposition rates (crystal sensor)